Thermal Plate Neg. QN

The solution for stable plate manufacture. One outstanding feature of the Saphira® Thermal Plate Neg. QN is its very wide processing latitude. Even under the toughest processing conditions, the plate lends stability to the entire plate manufacturing process. Differences in temperature, pH value, activity, or quantities of replenisher have little to no impact on the print result. Imaging causes the light-sensitive layer to fuse. It bonds with the aluminum substrate to ensure excellent stability throughout the run. Non-imaged areas are simply washed out.

Perfect print results. The flat substrate technology and excellent edge definition of the Saphira Thermal Plate Neg. QN minimize print fluctuations throughout the run and also reduce waste.

The gateway to eco-friendly plate manufacture. The Saphira Thermal Plate Neg. QN does not require any aggressive developer. The Saphira Thermal Plate Solution QN is only required to wash out the non-imaged layer. Low replenisher consumption and a long-lasting wash-out solution also reduce the quantities of processing chemicals required.

Benefits:

• Runs of up to 200,0001 prints without post-baking
• Very wide processing latitude
• Excellent edge definition
• No use of aggressive developer
• Low consumption of wash-out solution